Chemical Activity of Thin Oxide Layers: Strong Interactions with the Support 
Yield a New Thin-Film Phase of ZnO

Schott, Vadim; Oberhofer, Harald; Birkner, Alexander; Xu, Mingchun; Wang, Yuemin; Muhler, Martin; Reuter, Karsten; Wöll, Christof

doi:10.1002/anie.201302315

Item

ITEM ACTIONSEXPORT

Add to Basket

Local TagsRelease HistoryDetailsSummary

Released

Journal Article

Chemical Activity of Thin Oxide Layers: Strong Interactions with the Support Yield a New Thin-Film Phase of ZnO

MPS-Authors

There are no MPG-Authors in the publication available

External Resource

No external resources are shared

Fulltext (restricted access)

There are currently no full texts shared for your IP range.

Fulltext (public)

There are no public fulltexts stored in PuRe

Supplementary Material (public)

There is no public supplementary material available

Citation

Schott, V., Oberhofer, H., Birkner, A., Xu, M., Wang, Y., Muhler, M., et al. (2013). Chemical Activity of Thin Oxide Layers: Strong Interactions with the Support Yield a New Thin-Film Phase of ZnO. Angewandte Chemie International Edition, 52(45), 11925-11929. doi:10.1002/anie.201302315.

Cite as: https://hdl.handle.net/21.11116/0000-000A-CF99-1

Abstract

Metal substrates affect the chemical properties of ZnO layers, which are important catalyst materials for the industrial production of methanol through the oxidation of CO. Interactions with the substrate lead to the formation of a new, planar ZnO thin-film phase, in which less highly oxidized Zn atoms bind CO more strongly than the Zn atoms in the normal wurtzite modification.