Shape control in wafer-based aperiodic 3D nanostructures

Hyeon-Ho, Jeong; Mark, Andrew G.; Gibbs, John G.; Reindl, Thomas; Waizmann, Ulrike; Weis, Juergen; Fischer, Peer

doi:10.1088/0957-4484/25/23/235302

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Shape control in wafer-based aperiodic 3D nanostructures

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Fischer, Peer
Max Planck Institute for Medical Research, Max Planck Society;

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Citation

Hyeon-Ho, J., Mark, A. G., Gibbs, J. G., Reindl, T., Waizmann, U., Weis, J., et al. (2014). Shape control in wafer-based aperiodic 3D nanostructures. Nanotechnology, 25(23): 235302, pp. 1-8. doi:10.1088/0957-4484/25/23/235302.

Cite as: https://hdl.handle.net/21.11116/0000-000B-050D-2

Abstract

Controlled local fabrication of three-dimensional (3D) nanostructures is important to explore and enhance the function of single nanodevices, but is experimentally challenging. We present a scheme based on e-beam lithography (EBL) written seeds, and glancing angle deposition (GLAD) grown structures to create nanoscale objects with defined shapes but in aperiodic arrangements. By using a continuous sacrificial corral surrounding the features of interest we grow isolated 3D nanostructures that have complex cross-sections and sidewall morphology that are surrounded by zones of clean substrate.