Catalytic chemical vapour deposition growth of single wall carbon nanotube 
films on different substrates for transparent electronic devices

Ansaldo, A.; Skakalova, V.; Di Zitti, E.; Ricci, D.; Roth, S.

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Catalytic chemical vapour deposition growth of single wall carbon nanotube films on different substrates for transparent electronic devices

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Ansaldo, A.
Abteilung v. Klitzing, Former Departments, Max Planck Institute for Solid State Research, Max Planck Society;

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Skakalova, V.
Abteilung v. Klitzing, Former Departments, Max Planck Institute for Solid State Research, Max Planck Society;

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Roth, S.
Abteilung v. Klitzing, Former Departments, Max Planck Institute for Solid State Research, Max Planck Society;

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Citation

Ansaldo, A., Skakalova, V., Di Zitti, E., Ricci, D., & Roth, S. (2007). Catalytic chemical vapour deposition growth of single wall carbon nanotube films on different substrates for transparent electronic devices. physica status solidi (b), 244(11), 3935-3938.

Cite as: https://hdl.handle.net/21.11116/0000-000F-01A7-3

Abstract

In this work we present our results concerning the growth of transparent carbon nanotube networks. The networks have been successfully grown on both oxidized silicon and quartz-glass substrates. Conductive and optical properties of these transparent films are discussed and compared to those obtained with other approaches. (c) 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.