Thin manganese films on Si(111)-(7x7): electronic structure and strain in 
silicide formation

Kumar, A.; Tallarida, M.; Hansmann, M.; Starke, U.; Horn, K.

Item

ITEM ACTIONSEXPORT

Add to Basket

Local TagsRelease HistoryDetailsSummary

Released

Journal Article

Thin manganese films on Si(111)-(7x7): electronic structure and strain in silicide formation

MPS-Authors

/persons/resource/persons280199

Kumar, A.
Department Solid State Spectroscopy (Bernhard Keimer), Max Planck Institute for Solid State Research, Max Planck Society;
Department Nanoscale Science (Klaus Kern), Max Planck Institute for Solid State Research, Max Planck Society;

/persons/resource/persons280552

Starke, U.
Scientific Facility Interface Analysis (Ulrich Starke), Max Planck Institute for Solid State Research, Max Planck Society;

External Resource

No external resources are shared

Fulltext (restricted access)

There are currently no full texts shared for your IP range.

Fulltext (public)

There are no public fulltexts stored in PuRe

Supplementary Material (public)

There is no public supplementary material available

Citation

Kumar, A., Tallarida, M., Hansmann, M., Starke, U., & Horn, K. (2004). Thin manganese films on Si(111)-(7x7): electronic structure and strain in silicide formation. Journal of Physics D, 37, 1083-1090.

Cite as: https://hdl.handle.net/21.11116/0000-000E-F5DF-3

Abstract

There is no abstract available