The kinetic MC modelling of reversible pattern formation in initial stages of 
thin metallic film growth on crystalline substrates

Kotomin, E. A.; Kuzovkov, V. N.; Zvejnieks, G.; Zhukovskii, Y.; Fuks, D.; Dorfman, S.; Stoneham, A. M.

Item

ITEM ACTIONSEXPORT

Add to Basket

Local TagsRelease HistoryDetailsSummary

Released

Journal Article

The kinetic MC modelling of reversible pattern formation in initial stages of thin metallic film growth on crystalline substrates

MPS-Authors

/persons/resource/persons280176

Kotomin, E. A.
Department Physical Chemistry of Solids (Joachim Maier), Max Planck Institute for Solid State Research, Max Planck Society;

/persons/resource/persons280205

Kuzovkov, V. N.
Department Physical Chemistry of Solids (Joachim Maier), Max Planck Institute for Solid State Research, Max Planck Society;

/persons/resource/persons280728

Zhukovskii, Y.
Department Physical Chemistry of Solids (Joachim Maier), Max Planck Institute for Solid State Research, Max Planck Society;

/persons/resource/persons279952

Fuks, D.
Department Physical Chemistry of Solids (Joachim Maier), Max Planck Institute for Solid State Research, Max Planck Society;

/persons/resource/persons279898

Dorfman, S.
Department Physical Chemistry of Solids (Joachim Maier), Max Planck Institute for Solid State Research, Max Planck Society;

External Resource

No external resources are shared

Fulltext (restricted access)

There are currently no full texts shared for your IP range.

Fulltext (public)

There are no public fulltexts stored in PuRe

Supplementary Material (public)

There is no public supplementary material available

Citation

Kotomin, E. A., Kuzovkov, V. N., Zvejnieks, G., Zhukovskii, Y., Fuks, D., Dorfman, S., et al. (2003). The kinetic MC modelling of reversible pattern formation in initial stages of thin metallic film growth on crystalline substrates. Solid State Communications, 125(9), 463-467.

Cite as: https://hdl.handle.net/21.11116/0000-000E-F94B-6

Abstract

The results of kinetic MC simulations of the reversible pattern
formation during the adsorption of mobile metal atoms on
crystalline substrates are discussed. Pattern formation,
simulated for submonolayer metal coverage, is characterized in
terms of the joint correlation functions for a spatial
distribution of adsorbed atoms. A wide range of situations,
from the almost irreversible to strongly reversible regimes, is
simulated. We demonstrate that the patterns obtained are
defined by a key dimensionless parameter: the ratio of the
mutual attraction energy between atoms to the substrate
temperature. Our ab initio calculations for the nearest Ag-Ag
adsorbate atom interaction on an MgO substrate give an
attraction energy as large as 1.6 eV, close to that in a free
molecule. This is in contrast to the small Ag adhesion and
migration energies (0.23 and 0.05 eV, respectively) on a
defect-free MgO substrate. (C) 2003 Elsevier Science Ltd. All
rights reserved.