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Chemical imaging of interfaces by sum-frequency generation microscopy: Application to patterned self-assembled monolayers

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Kuhnke,  K.
Department Nanoscale Science (Klaus Kern), Max Planck Institute for Solid State Research, Max Planck Society;

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Hoffmann,  D. M. P.
Department Nanoscale Science (Klaus Kern), Max Planck Institute for Solid State Research, Max Planck Society;

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Wu,  X. C.
Department Nanoscale Science (Klaus Kern), Max Planck Institute for Solid State Research, Max Planck Society;

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Bittner,  A. M.
Department Nanoscale Science (Klaus Kern), Max Planck Institute for Solid State Research, Max Planck Society;

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Kern,  K.
Department Nanoscale Science (Klaus Kern), Max Planck Institute for Solid State Research, Max Planck Society;

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Citation

Kuhnke, K., Hoffmann, D. M. P., Wu, X. C., Bittner, A. M., & Kern, K. (2003). Chemical imaging of interfaces by sum-frequency generation microscopy: Application to patterned self-assembled monolayers. Applied Physics Letters, 83(18), 3830-3832.


Cite as: https://hdl.handle.net/21.11116/0000-000E-E5AD-D
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