In situ etching with AsBr3 and regrowth in molecular beam epitaxy

Schuler, H.; Kaneko, T.; Lipinski, M.; Eberl, K.

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In situ etching with AsBr₃ and regrowth in molecular beam epitaxy

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Lipinski, M.
Former Scientific Facilities, Max Planck Institute for Solid State Research, Max Planck Society;

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Eberl, K.
Former Scientific Facilities, Max Planck Institute for Solid State Research, Max Planck Society;

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Schuler, H., Kaneko, T., Lipinski, M., & Eberl, K. (2000). In situ etching with AsBr₃ and regrowth in molecular beam epitaxy. Semiconductor Science and Technology, 15, 169-177.

Cite as: https://hdl.handle.net/21.11116/0000-000E-E55B-A

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