Fabrication of photonic crystals by deep X-ray lithography.

Feiertag, G.; Ehrfeld, W.; Freimuth, H.; Kolle, H.; Lehr, H.; Schmidt, M.; Sigalas, M. M.; Soukoulis, C. M.; Kiriakidis, G.; Petersen, T.; Kuhl, J.; Köenig, W.

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Fabrication of photonic crystals by deep X-ray lithography.

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Schmidt, M.
Research Group Organic Electronics (Hagen Klauk), Max Planck Institute for Solid State Research, Max Planck Society;

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Kuhl, J.
Former Scientific Facilities, Max Planck Institute for Solid State Research, Max Planck Society;

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Feiertag, G., Ehrfeld, W., Freimuth, H., Kolle, H., Lehr, H., Schmidt, M., et al. (1997). Fabrication of photonic crystals by deep X-ray lithography. Applied Physics Letters, 71, 1441-1443.

Cite as: https://hdl.handle.net/21.11116/0000-000E-DA0C-0

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