Step pinning and hillock formation in (Al,Ga)N films on native AlN substrates

Schulz, Tobias; Yoo, Su-Hyun; Lymperakis, Liverios; Richter, C.; Zatterin, E.; Lachowski, A.; Hartmann, C.; Foronda, H. M.; Brandl, C.; Lugauer, H. J.; Hoffmann, Marc P.; Albrecht, Martin

doi:10.1063/5.0125480

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Step pinning and hillock formation in (Al,Ga)N films on native AlN substrates

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Yoo, Su-Hyun
Computational Materials Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Schulz, T., Yoo, S.-H., Lymperakis, L., Richter, C., Zatterin, E., Lachowski, A., et al. (2022). Step pinning and hillock formation in (Al,Ga)N films on native AlN substrates. Journal of Applied Physics, 132(22): 223102. doi:10.1063/5.0125480.

Cite as: https://hdl.handle.net/21.11116/0000-000B-FC1D-A

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