N2 adsorption and dissociation on thin iron films on W(110)

Homann, K.; Kuhlenbeck, H.; Freund, Hans-Joachim

doi:10.1016/0039-6028(94)00834-5

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N₂ adsorption and dissociation on thin iron films on W(110)

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Homann, K., Kuhlenbeck, H., & Freund, H.-J. (1995). N₂ adsorption and dissociation on thin iron films on W(110). Surface Science, 327(3), 216-224. doi:10.1016/0039-6028(94)00834-5.

Cite as: https://hdl.handle.net/21.11116/0000-000E-44D9-1

Abstract

Angle-resolved ultraviolet photoelectron spectroscopy (ARUPS), thermal desorption spectroscopy (TDS) and low energy electron diffraction (LEED) have been utilized to study molecularly adsorbed N₂ on thin (110) oriented Fe layers grown on W(110). Layers with thicknesses of up to 2 monolayers acquire the lattice constant of the substrate which is by 10.4% larger than that of iron. These strained layers show different properties than the bulk Fe(110) surface. To our knowledge no molecularly adsorbed N₂ species on bulk Fe(110) is reported in the literature at T ≥ 80K, whereas on the pseudomorphically grown iron layers on W(110) we observe a molecularly adsorbed species which stands upright on the surface. Pseudomorphically grown Fe layers on W(110) show a strongly enhanced dissociation probability for adsorbed N₂ which we attribute to the open structure of the strained surface. For comparison also results for thick Fe(110) layers, which resemble the structure of an unstrained Fe(110) surface, are reported.