Adsorption and UV-Laser Desorption of NO/O/Ni(100)

Mull, Th.; Kuhlenbeck, H.; Odörfer, G; Jaeger, R.; Xu, C.; Baumeister, B.; Menges, M.; Illing, G.; Freund, Hans-Joachim; Weide, D.; Andresen, P.

doi:10.1007/978-3-642-84145-3_21

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Adsorption and UV-Laser Desorption of NO/O/Ni(100)

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Mull, T., Kuhlenbeck, H., Odörfer, G., Jaeger, R., Xu, C., Baumeister, B., et al. (1990). Adsorption and UV-Laser Desorption of NO/O/Ni(100). In G. Betz, & P. Varga (Eds.), Desorption Induced by Electronic Transitions DIET IV - Proceedings of the Fourth International Workshop, Gloggnitz, Austria, October 2–4, 1989 (pp. 169-173). Berlin: Springer.

Cite as: https://hdl.handle.net/21.11116/0000-000E-AFE8-8

Abstract

We have studied adsorption as well as thermal and UV-laser (193 nm) desorption of NO adsorbed on Ni(100), on O(c2×2)/Ni(100) and on epitaxially grown oxides NiO(111) and NiO(100) using HREELS, XPS, NEXAFS, LEED and TPD. We find NO on NiO to be weakly chemisorbed. Laser desorption is only induced from the oxidic surfaces. Laser desorption cross sections are two orders of magnitude higher than gas phase photoabsorption cross sections for NO. NO₂/NiO(100) has been studied via XPS, LEED and TPD. NO is probably the predominant desorption product under UV laser impact /1/. Reaction also takes place under XPS influence and under impact of secondary electrons from the X-ray gun. Possible desorption processes are discussed.