English
 
Help Privacy Policy Disclaimer
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT

Released

Journal Article

Characterization of individual layers in a bilayer electron system produced in a wide quantum well

MPS-Authors
/persons/resource/persons280605

von Klitzing,  K.
Abteilung v. Klitzing, Former Departments, Max Planck Institute for Solid State Research, Max Planck Society;

/persons/resource/persons280531

Smet,  J.
Abteilung v. Klitzing, Former Departments, Max Planck Institute for Solid State Research, Max Planck Society;
Research Group Solid State Nanophysics (Jurgen H. Smet), Max Planck Institute for Solid State Research, Max Planck Society;

External Resource
No external resources are shared
Fulltext (restricted access)
There are currently no full texts shared for your IP range.
Fulltext (public)
There are no public fulltexts stored in PuRe
Supplementary Material (public)
There is no public supplementary material available
Citation

Dorozhkin, S., Kapustin, A., Fedorov, I., Umansky, V., von Klitzing, K., & Smet, J. (2018). Characterization of individual layers in a bilayer electron system produced in a wide quantum well. Journal of Applied Physics, 123(8): 084301.


Cite as: https://hdl.handle.net/21.11116/0000-000E-D630-A
Abstract
Here, we report on a transparent method to characterize individual layers in a double-layer electron system, which forms in a wide quantum well, and to determine their electron densities. The technique relies on the simultaneous measurement of the capacitances between the electron system and gates located on either side of the well. Modifications to the electron wave function due to the population of the second subband and the appearance of an additional electron layer can be detected. The magnetic field dependence of these capacitances is dominated by quantum corrections caused by the occupation of Landau levels in the nearest electron layer. The technique should be equally applicable to other implementations of a double layer electron system. Published by AIP Publishing.