In situ Polarized Neutron Reflectometry: Epitaxial Thin-Film Growth of Fe on 
Cu(001) by dc Magnetron Sputtering

Kreuzpaintner, W.; Wiedemann, B.; Stahn, J.; Moulin, J.; Mayr, S.; Mairoser, T.; Schmehl, A.; Herrnberger, A.; Korelis, P.; Haese, M.; Ye, J.; Pomm, M.; Böni, P.; Mannhart, J.

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In situ Polarized Neutron Reflectometry: Epitaxial Thin-Film Growth of Fe on Cu(001) by dc Magnetron Sputtering

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Mannhart, J.
Department Solid State Quantum Electronics (Jochen Mannhart), Max Planck Institute for Solid State Research, Max Planck Society;

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Citation

Kreuzpaintner, W., Wiedemann, B., Stahn, J., Moulin, J., Mayr, S., Mairoser, T., et al. (2017). In situ Polarized Neutron Reflectometry: Epitaxial Thin-Film Growth of Fe on Cu(001) by dc Magnetron Sputtering. Physical Review Applied, 7(5): 054004.

Cite as: https://hdl.handle.net/21.11116/0000-000E-D19A-8

Abstract

The stepwise growth of epitaxial Fe on Cu(001)/Si(001), investigated by in situ polarized neutron reflectometry is presented. A sputter deposition system was integrated into the neutron reflectometer AMOR at the Swiss neutron spallation source SINQ, which enables the analysis of the microstructure and magnetic moments during all deposition steps of the Fe layer. We report on the progressive evolution of the accessible parameters describing the microstructure and the magnetic properties of the Fe film, which reproduce known features and extend our knowledge on the behavior of ultrathin iron films.