Direct Observation of the Thickness-Induced Crystallization and Stress Build-Up 
during Sputter-Deposition of Nanoscale Silicide Films

Krause, B.; Abadias, G.; Michel, A.; Wochner, P.; Ibrahimkutty, S.; Baumbach, T.

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Direct Observation of the Thickness-Induced Crystallization and Stress Build-Up during Sputter-Deposition of Nanoscale Silicide Films

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Wochner, P.
Department Solid State Spectroscopy (Bernhard Keimer), Max Planck Institute for Solid State Research, Max Planck Society;

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Krause, B., Abadias, G., Michel, A., Wochner, P., Ibrahimkutty, S., & Baumbach, T. (2016). Direct Observation of the Thickness-Induced Crystallization and Stress Build-Up during Sputter-Deposition of Nanoscale Silicide Films. ACS Applied Materials & Interfaces, 8(50), 34888-34895.

Cite as: https://hdl.handle.net/21.11116/0000-000E-D082-3

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