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Journal Article

Self-Assembly of a Halogenated Molecule on Oxide-Passivated Cu(110)


Gutzler,  R.
Max Planck Society;

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El Garah, M., Lipton-Duffin, J., MacLeod, J. M., Gutzler, R., Palmino, F., Luzet, V., et al. (2013). Self-Assembly of a Halogenated Molecule on Oxide-Passivated Cu(110). Chemistry - An Asian Journal, 8, 1813-1817.

Cite as: https://hdl.handle.net/21.11116/0000-000E-C6A1-C
The supramolecular self-assembly of brominated molecules was investigated and compared on Cu(110) and Cu(110)O(2x1) surfaces under ultrahigh vacuum. By using scanning tunnelling microscopy, we show that brominated molecules form a disordered structure on Cu(110), whereas a well-ordered supramolecular network is observed on the Cu(110)O(2x1) surface. The different adsorption behaviors of these two surfaces are described in terms of weakened molecule-substrate interactions on Cu(110)O(2x1) as opposed to bare Cu(110). The effect of oxygen-passivation is to suppress debromination and it can be a convenient approach for investigating other self-assembly processes on copper-based substrates.