English
 
Help Privacy Policy Disclaimer
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT

Released

Journal Article

Contact Doping and Ultrathin Gate Dielectrics for Nanoscale Organic Thin-Film Transistors

MPS-Authors
/persons/resource/persons280733

Zschieschang,  U.
Research Group Organic Electronics (Hagen Klauk), Max Planck Institute for Solid State Research, Max Planck Society;

/persons/resource/persons280151

Klauk,  H.
Research Group Organic Electronics (Hagen Klauk), Max Planck Institute for Solid State Research, Max Planck Society;

External Resource
No external resources are shared
Fulltext (restricted access)
There are currently no full texts shared for your IP range.
Fulltext (public)
There are no public fulltexts stored in PuRe
Supplementary Material (public)
There is no public supplementary material available
Citation

Ante, F., Kälblein, D., Zschieschang, U., Canzler, T. W., Werner, A., Takimiya, K., et al. (2011). Contact Doping and Ultrathin Gate Dielectrics for Nanoscale Organic Thin-Film Transistors. Small, 7(9), 1186-1191.


Cite as: https://hdl.handle.net/21.11116/0000-000E-C09F-6
Abstract
There is no abstract available