English
 
Help Privacy Policy Disclaimer
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT

Released

Journal Article

Terephthalic acid adsorption on Si(111)-(√3x√3)-Bi surfaces: Effect of Bi coverage

MPS-Authors
/persons/resource/persons279862

Costantini,  G.
Department Nanoscale Science (Klaus Kern), Max Planck Institute for Solid State Research, Max Planck Society;

/persons/resource/persons280131

Kern,  K.
Department Nanoscale Science (Klaus Kern), Max Planck Institute for Solid State Research, Max Planck Society;

External Resource
No external resources are shared
Fulltext (restricted access)
There are currently no full texts shared for your IP range.
Fulltext (public)
There are no public fulltexts stored in PuRe
Supplementary Material (public)
There is no public supplementary material available
Citation

Suzuki, T., Lutz, T., Costantini, G., & Kern, K. (2011). Terephthalic acid adsorption on Si(111)-(√3x√3)-Bi surfaces: Effect of Bi coverage. Surface Science, 605(23-24), 1994-1998.


Cite as: https://hdl.handle.net/21.11116/0000-000E-BF75-8
Abstract
The influence of the density of metallic atoms on the formation of supramolecular structures onto Si surface alloys is investigated by scanning tunneling microscopy. Terephthalic acid (TPA) adsorption experiments are performed on the Si(111) alpha- and beta-(root 3 x root 3)-Bi surfaces. Although both surfaces have the same unit cell with Bi atoms incorporated into the Si substrate, they show a completely different behavior in respect to the formation of the supramolecular arrays. TPA molecules do not build any regular structure and adsorb randomly on the a surface but self-assemble into ordered and extended layers on the beta surface. This demonstrates that the absence of dangling bonds in metal-Si surface alloys is not a sufficient condition for supramolecular self-assembly but that the surface density of metallic atoms is a further essential parameter. (C) 2011 Elsevier B.V. All rights reserved.