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Journal Article

Semiconductor sub-micro-/nanochannel networks by deterministic layer wrinkling

MPS-Authors
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Mei,  Y. F.
Former Scientific Facilities, Max Planck Institute for Solid State Research, Max Planck Society;

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Thurmer,  D. J.
Former Scientific Facilities, Max Planck Institute for Solid State Research, Max Planck Society;

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Cavallo,  F.
Former Scientific Facilities, Max Planck Institute for Solid State Research, Max Planck Society;

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Kiravittaya,  S.
Former Scientific Facilities, Max Planck Institute for Solid State Research, Max Planck Society;

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Schmidt,  O. G.
Department Nanoscale Science (Klaus Kern), Max Planck Institute for Solid State Research, Max Planck Society;
Scientific Facility Nanostructuring Lab (Jürgen Weis), Max Planck Institute for Solid State Research, Max Planck Society;
Abteilung v. Klitzing, Former Departments, Max Planck Institute for Solid State Research, Max Planck Society;
Former Scientific Facilities, Max Planck Institute for Solid State Research, Max Planck Society;

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Citation

Mei, Y. F., Thurmer, D. J., Cavallo, F., Kiravittaya, S., & Schmidt, O. G. (2007). Semiconductor sub-micro-/nanochannel networks by deterministic layer wrinkling. Advanced Materials, 19(16), 2124-2128.


Cite as: https://hdl.handle.net/21.11116/0000-000E-B68D-6
Abstract
Semiconductor micro-/nanochannel networks are developed by deterministic layer wrinkling and applied into a fluidics study. Both linear (see figure) and circular nanochannel networks, consisting of a main channel and several perpendicularly oriented branch channels, are created, where the periodicity and position of the branch channels can be tuned and controlled by changing the width of the partially released layers and by applying appropriate lithography.