Voltage x-ray reflectometry: A method to study electric-field-induced changes 
to interfacial electronic structures

Ilse, S. E.; Schütz, Gisela; Goering, E.

doi:10.1103/PhysRevLett.131.036201

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Voltage x-ray reflectometry: A method to study electric-field-induced changes to interfacial electronic structures

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Ilse, S. E.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;
Max-Planck-Institute for Solid State Research, D-70569 Stuttgart, Germany;

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Schütz, Gisela
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Goering, E.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;
Max-Planck-Institute for Solid State Research, D-70569 Stuttgart, Germany;

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https://doi.org/10.1103/PhysRevLett.131.036201
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引用

Ilse, S. E., Schütz, G., & Goering, E. (2023). Voltage x-ray reflectometry: A method to study electric-field-induced changes to interfacial electronic structures. Physical Review Letters, 131(3):. doi:10.1103/PhysRevLett.131.036201.

引用: https://hdl.handle.net/21.11116/0000-000E-0689-1

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