Catalyst patterning for carbon nanotube growth on elevating posts by 
self-aligned double-layer electron beam lithography

Häffner, M.; Heeren, A.; Haug, A.; Schuster, E.; Sagar, A.; Fleischer, M.; Peisert, H.; Burghard, M.; Chassé, T.; Kern, D. P.

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Catalyst patterning for carbon nanotube growth on elevating posts by self-aligned double-layer electron beam lithography

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Burghard, M.
Department Nanoscale Science (Klaus Kern), Max Planck Institute for Solid State Research, Max Planck Society;

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Häffner, M., Heeren, A., Haug, A., Schuster, E., Sagar, A., Fleischer, M., et al. (2008). Catalyst patterning for carbon nanotube growth on elevating posts by self-aligned double-layer electron beam lithography. Journal of Vacuum Science & Technology B, 26(6), 2447-2450.

Cite as: https://hdl.handle.net/21.11116/0000-000E-AEBF-8

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