In situ Thermal Refractive Index Trimming of Silicon Nitride Waveguides with 
Suspended Heaters

Xue, Tianyuan; Poon, Joyce K. S.; Sacher, Wesley D.

doi:10.1364/CLEO_SI.2023.STu3J.4

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In situ Thermal Refractive Index Trimming of Silicon Nitride Waveguides with Suspended Heaters

MPS-Authors

/persons/resource/persons277233

Xue, Tianyuan
Nanophotonics, Integration, and Neural Technology, Max Planck Institute of Microstructure Physics, Max Planck Society;

/persons/resource/persons257612

Poon, Joyce K. S.
Nanophotonics, Integration, and Neural Technology, Max Planck Institute of Microstructure Physics, Max Planck Society;

/persons/resource/persons258003

Sacher, Wesley D.
Nanophotonics, Integration, and Neural Technology, Max Planck Institute of Microstructure Physics, Max Planck Society;

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https://doi.org/10.1364/CLEO_SI.2023.STu3J.4
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引用

Xue, T., Poon, J. K. S., & Sacher, W. D. (2023). In situ Thermal Refractive Index Trimming of Silicon Nitride Waveguides with Suspended Heaters. In CLEO: Science and Innovations 2023. Optica Publishing Group. doi:10.1364/CLEO_SI.2023.STu3J.4.

引用: https://hdl.handle.net/21.11116/0000-000E-6A2A-D

要旨

We demonstrate low-power thermal refractive index trimming of silicon nitride waveguides using suspended heaters. An average effective index change of -2.6×10^-3 was achieved at a wavelength of 1550 nm with a power dissipation of 40mW after 1.5 hours.