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Gap collapse and flat band induced by uniaxial strain in 1T−TaS2

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Nicholson,  Christopher W.
Physical Chemistry, Fritz Haber Institute, Max Planck Society;

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PhysRevB.109.035167.pdf
(出版社版), 3MB

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引用

Nicholson, C. W., Petocchi, F., Salzmann, B., Witteveen, C., Rumo, M., Kremer, G., Ivashko, O., von Rohr, F. O., Werner, P., & Monney, C. (2024). Gap collapse and flat band induced by uniaxial strain in 1T−TaS2. Physical Review B, 109(3):. doi:10.1103/PhysRevB.109.035167.


引用: https://hdl.handle.net/21.11116/0000-000E-7ECE-E
要旨
Interlayer coupling is strongly implicated in the complex electronic properties of 1T-TaS2. Uniaxial strain engineering offers a route to modify this coupling in order to elucidate its interplay with the electronic structure and electronic correlations. Here, we employ angle-resolved photoemission spectroscopy (ARPES) to reveal the effect of uniaxial strain on the electronic structure in 1T-TaS2. The gap of the normally insulating ground state is significantly reduced, with a correlated flat band appearing close to the Fermi level. Temperature-dependent ARPES measurements reveal that the flat band only develops below the commensurate charge density wave (CCDW) transition, where interlayer dimerization produces a band insulator in unstrained samples. Electronic structure calculations suggest that the correlated flat band is stabilized by a modified interlayer coupling of the Ta dz2 electrons. Further hints of a strain-induced structural modification of the interlayer order are obtained from x-ray diffraction. Our combined approach provides critical input for understanding the complex phase diagram of this platform material for correlated physics.