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Journal Article

Effect of the atomic structure of complexions on the active disconnection mode during shear-coupled grain boundary motion

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Pemma,  Swetha
Atomistic Modelling of Material Interfaces, Project Groups, Structure and Nano-/ Micromechanics of Materials, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Dehm,  Gerhard
Structure and Nano-/ Micromechanics of Materials, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Brink,  Tobias
Atomistic Modelling of Material Interfaces, Project Groups, Structure and Nano-/ Micromechanics of Materials, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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PhysRevMaterials.8.063602.pdf
(Publisher version), 9MB

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Citation

Pemma, S., Janisch, R., Dehm, G., & Brink, T. (2024). Effect of the atomic structure of complexions on the active disconnection mode during shear-coupled grain boundary motion. Physical Review Materials, 8(6): 063602. doi:10.1103/PhysRevMaterials.8.063602.


Cite as: https://hdl.handle.net/21.11116/0000-000F-A919-7
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