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Etching of the Intermetallic Compounds PdGa and Pd3Ga7: An Effective Way to Increase Catalytic Activity?

MPS-Authors
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Kovnir,  Kirill
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

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Osswald,  Jürgen
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

/persons/resource/persons22163

Teschner,  Detre
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

/persons/resource/persons22227

Weinberg,  Gisela
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

/persons/resource/persons22241

Wild,  Ute
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

/persons/resource/persons21743

Knop-Gericke,  Axel
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

/persons/resource/persons21999

Ressler,  Thorsten
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

Grin,  Yuri
Max Planck Society;

/persons/resource/persons22071

Schlögl,  Robert
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

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Citation

Kovnir, K., Osswald, J., Armbrüster, M., Teschner, D., Weinberg, G., Wild, U., et al. (2009). Etching of the Intermetallic Compounds PdGa and Pd3Ga7: An Effective Way to Increase Catalytic Activity? Journal of Catalysis, 264(2), 93-103. doi:10.1016/j.jcat.2009.03.007.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-FA9C-9
Abstract
The structurally ordered intermetallic compounds PdGa and Pd3Ga7 constitute highly selective catalysts for the selective semi-hydrogenation of acetylene. The milling of assynthesized samples, followed by etching with ammonia solution increased the activity of the catalysts by factor of 90. Chemically etched samples possess high activity and simultaneously keep their high selectivity. Chemical analysis confirms that the etching procedure is mostly specific to gallium species, thus less affecting the palladium. Detailed investigations reveal the influence of the chemical etching on the morphology and surface of the particles. As a result of the etching, nano-caverns are formed (SEM and BET), and the surface is enriched in palladium (XPS and EDX), while the bulk crystal structure is not affected (XRD). The mechanism and applicability of the etching procedure is discussed in view of the active-site isolation concept.