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Formaldehydbildung auf den Vanadiumoxidoberflächen V2O3(0001) und V2O5(001): Wie bildet sich der stabile Methoxy-Zwischenzustand?

MPS-Authors
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Göbke,  Daniel
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Romanyshyn,  Yuriy
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Guimond,  Sébastien
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Sturm,  Jacobus M.
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Kuhlenbeck,  Helmut
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Freund,  Hans-Joachim
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Citation

Göbke, D., Romanyshyn, Y., Guimond, S., Sturm, J. M., Kuhlenbeck, H., Döbler, J., et al. (2009). Formaldehydbildung auf den Vanadiumoxidoberflächen V2O3(0001) und V2O5(001): Wie bildet sich der stabile Methoxy-Zwischenzustand? Angewandte Chemie, 121(20), 3750-3753. doi:10.1002/ange.200805618.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0010-FACC-E
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