Differential susceptibility to noise of mixed Turing and Hopf modes in a 
photosensitive chemical medium

Alonso, Sergio; Míguez, David G.; Sagués, Francesc

doi:10.1209/0295-5075/81/30006

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学術論文

Differential susceptibility to noise of mixed Turing and Hopf modes in a photosensitive chemical medium

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Alonso, Sergio
Physical Chemistry, Fritz Haber Institute, Max Planck Society;

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引用

Alonso, S., Míguez, D. G., & Sagués, F. (2008). Differential susceptibility to noise of mixed Turing and Hopf modes in a photosensitive chemical medium. Europhysics Letters, 81(3):. doi:10.1209/0295-5075/81/30006.

引用: https://hdl.handle.net/11858/00-001M-0000-0010-FDB0-0

要旨

Pattern formation induced by noise is a celebrated phenomenon in diverse experimental and numerical systems. Here we report experiments with the chlorine dioxide-iodine-malonic acid reaction (CDIMA) when illuminated with spatio-temporal stochastic intensity in the vicinity of the Hopf and Turing codimension-two-bifurcation. A noise-driven phenomenon of attenuation of oscillations is found. Numerical simulations confirm these results and farther away from the Turing-Hopf-boundary permit to unveil a true noise-mediated selection mechanism of Turing patterns over oscillatory modes.