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Atomic structure of a thin silica film on a Mo(112) substrate: A two-dimensional network of SiO4 tetrahedra

MPS-Authors
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Weissenrieder,  Jonas
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Kaya,  Sarp
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Lu,  Jun-Ling
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Shaikhutdinov,  Shamil
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Freund,  Hans-Joachim
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Fulltext (public)

e076103.pdf
(Publisher version), 297KB

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Citation

Weissenrieder, J., Kaya, S., Lu, J.-L., Gao, H.-J., Shaikhutdinov, S., Freund, H.-J., et al. (2005). Atomic structure of a thin silica film on a Mo(112) substrate: A two-dimensional network of SiO4 tetrahedra. Physical Review Letters, 95(07), 076103–1-076103–4. doi:10.1103/PhysRevLett.95.076103.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0011-07E9-1
Abstract
The structure of a thin single crystalline SiO2 film grown on Mo(112) has been studied by scanning tunneling microscopy, infrared reflection absorption spectroscopy, and x-ray photoelectron spectroscopy. In excellent agreement with the experimental results, density functional theory calculations show that the film consists of a two-dimensional network of corner sharing [SiO4] tetrahedra, with one oxygen of each tetrahedron binding to the protruding Mo atoms of the Mo(112) surface.