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Defect-induced gap states in Al2O3 thin films on NiAl(110)

MPS-Authors
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Nilius,  Niklas
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Kulawik,  Maria
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Rust,  Hans-Peter
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Freund,  Hans-Joachim
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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フルテキスト (公開)

PhysRevB.69.121401.pdf
(出版社版), 545KB

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引用

Nilius, N., Kulawik, M., Rust, H.-P., & Freund, H.-J. (2004). Defect-induced gap states in Al2O3 thin films on NiAl(110). Physical Review B, 69, 121401–1-121401–4. doi:10.1103/PhysRevB.69.121401.


引用: https://hdl.handle.net/11858/00-001M-0000-0011-0D3E-2
要旨
The electronic properties of one-dimensional defects in ultrathin Al2O3 films have been investigated by low-temperature STM and STS. Whereas line defects between two oxide domains show almost no topographic contrast in low bias images, they appear with a distinct corrugation at higher positive sample bias. Conductance spectroscopy and imaging reveal three unoccupied states at +2.5, +3.0, and +4.5 V localized along the domain boundaries. The defect-induced states are responsible for the observed contrast variation and originate most likely from a nonstoichiometric oxide composition at the interface between two Al2O3 domains.