Low temperature decomposition of NO on ordered alumina films

Schauermann, Swetlana; Johánek, Viktor; Laurin, Mathias; Libuda, Jörg; Freund, Hans-Joachim

doi:10.1016/j.cplett.2003.09.101

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Low temperature decomposition of NO on ordered alumina films

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Schauermann, Swetlana
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Johánek, Viktor
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Laurin, Mathias
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Libuda, Jörg
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Freund, Hans-Joachim
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Schauermann, S., Johánek, V., Laurin, M., Libuda, J., & Freund, H.-J. (2003). Low temperature decomposition of NO on ordered alumina films. Chemical Physics Letters, 381(3-4), 298-305. doi:10.1016/j.cplett.2003.09.101.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0011-1257-5

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