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Temperature- and electron-beam-induced crystallization of zirconia thin films deposited from an aqueous medium: a transmission electron microscopy study

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Roddatis,  Vladimir V.
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

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Su,  Dang Sheng
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

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Jentoft,  Friederike C.
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

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Schlögl,  Robert
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

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Citation

Roddatis, V. V., Su, D. S., Jentoft, F. C., & Schlögl, R. (2002). Temperature- and electron-beam-induced crystallization of zirconia thin films deposited from an aqueous medium: a transmission electron microscopy study. Philosophical Magazine A, 82(15), 2825-2839. doi:10.1080/01418610208240068.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0011-1650-F
Abstract
Thin zirconia films prepared by self-assembled monolayer (SAM) mediated deposition from aqueous medium was investigated by transmission electron microscopy (TEM) and electron-energy loss spectroscopy (EELS). As-grown films were amorphous, and annealing at temperatures below 525°C did not influence the film structure. Annealing at 550°C led to crystallization; amorphous material transformed into the tetragonal phase of ZrO2, yielding a polycrystalline film consisting of 10-50 nm sized grains. After annealing at 600ºC, a small fraction of monoclinic phase was detected in addition to the tetragonal phase. Sulphur signals were visible in EDX spectra of as-grown and of annealed films, with a reduced sulphur content after annealing. Electron beam irradiation also induced crystallization of amorphous material in as-grown films to give tetragonal ZrO2; in this case the grains forming the polycrystalline film were only 5-10 nm in size.