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Journal Article

Structural Characterization of ZrO2 Thin Films Produced via Self-Assembled Monolayer-Mediated Deposition from Aqueous Dispersions

MPS-Authors

Polli,  Andrew D.
Max Planck Society;

Wagner,  Thomas
Max Planck Society;

/persons/resource/persons21511

Fischer,  Armin
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

/persons/resource/persons22227

Weinberg,  Gisela
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

/persons/resource/persons21673

Jentoft,  Friederike C.
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

/persons/resource/persons22071

Schlögl,  Robert
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

Rühle,  Manfred
Max Planck Society;

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Citation

Polli, A. D., Wagner, T., Fischer, A., Weinberg, G., Jentoft, F. C., Schlögl, R., et al. (2000). Structural Characterization of ZrO2 Thin Films Produced via Self-Assembled Monolayer-Mediated Deposition from Aqueous Dispersions. Thin Solid Films, 379(1-2), 122-127. doi:10.1016/S0040-6090(00)01562-5.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0011-1ADB-A
Abstract
Thin ZrO2 films were produced at 323 K by the deposition of colloids from stable, aqueous
dispersions (formed from 4 mM Zr(SO4)2 in 0.4 N HCl) onto silicon wafer-supported,
functionalized self-assembled monolayers (SAMs). The deposition took place without visible bulk
precipitation. As-deposited and heat-treated films were characterized by high-resolution
transmission electron, analytical electron and scanning electron microscopy. In each case, an
amorphous layer was found between the Si single crystal and the nanocrystalline ZrO2 film. The
amorphous layer of the as-deposited films was found to be composed of two distinct layers: SAM
and SiO2. Upon heat treatment at 773 K for 2 h in air or Ar, the SAM layer was no longer
observed, suggesting that it decomposes and is removed completely in either atmosphere. The
as-deposited films had a grain size of ~5 nm throughout the film thickness. Following heat treatment,
a slight increase in grain size was observed. Deposition without the SAM was also attempted, but
failed to produce a strongly adherent, uniform film.