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Journal Article

Atomic force microscopy studies of oxide thin films on organic self-assembled monolayers

MPS-Authors

Niesen,  Thomas P.
Max Planck Society;

Bill,  Joachim
Max Planck Society;

Aldinger,  Fritz
Max Planck Society;

Rühle,  Manfred
Max Planck Society;

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Fischer,  Armin
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

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Jentoft,  Friederike C.
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

/persons/resource/persons22071

Schlögl,  Robert
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

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Citation

Niesen, T. P., De Guire, M. R., Bill, J., Aldinger, F., Rühle, M., Fischer, A., et al. (1999). Atomic force microscopy studies of oxide thin films on organic self-assembled monolayers. Journal of Materials Research, 14(6), 2464-2475. doi:10.1557/JMR.1999.0331.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0011-1D43-8
Abstract
Oxidic zirconium films prepared by chemical deposition from aqueous medium on sulfonic acid terminated self-assembled monolayers attached to an oxidized silicon surface were investigated with scanning electron microscopy and atomic force microscopy. Bulk precipitate forms in the 4mM Zr(SO4)2*4H2O, 0.4N HCl deposition medium at 343 K after approximately 30 min. Precipitate particles (200 nm and larger) were found embedded into the oxidic zirconium film and adsorbed on top of the film; they could be washed off but patches of the film were removed. Working with unstable deposition solutions, in which homogeneous nucleation occurs, leads to preparation-inherent flaws in the film.