Comparison of the gas release at a hydrophobic and a hydrophilic direct bonding 
interface

Mack, S.; Baumann, H.; Werner, Harald; Schlögl, Robert

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Comparison of the gas release at a hydrophobic and a hydrophilic direct bonding interface

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Mack, S.
Max Planck Society;

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Werner, Harald
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

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Schlögl, Robert
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

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Mack, S., Baumann, H., Werner, H., & Schlögl, R. (1998). Comparison of the gas release at a hydrophobic and a hydrophilic direct bonding interface. In U. Gösele (Ed.), Proceedings of the Fourth International Symposium on Semiconductor Wafer Bonding: Science, Technology, and Applications (pp. 299-306). Pennington, NJ: Electrochemical Society.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0011-1E7A-8

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