English
 
User Manual Privacy Policy Disclaimer Contact us
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT

Released

Journal Article

The mechanism of the anodic oxidation of silicon in acidic fluoride solutions revisited

MPS-Authors
/persons/resource/persons21545

Gerischer,  Heinz
Physical Chemistry, Fritz Haber Institute, Max Planck Society;

/persons/resource/persons21298

Allongue,  Philippe
Physical Chemistry, Fritz Haber Institute, Max Planck Society;

/persons/resource/persons21439

Costa Kieling,  Virginia
Physical Chemistry, Fritz Haber Institute, Max Planck Society;

External Ressource
No external resources are shared
Fulltext (public)
There are no public fulltexts stored in PuRe
Supplementary Material (public)
There is no public supplementary material available
Citation

Gerischer, H., Allongue, P., & Costa Kieling, V. (1993). The mechanism of the anodic oxidation of silicon in acidic fluoride solutions revisited. Berichte der Bunsen-Gesellschaft fur Physikalische Chemie, 97(6), 753-756.


Cite as: http://hdl.handle.net/11858/00-001M-0000-0011-2152-5
Abstract
The present experience of the electrochemical dissolution of silicon and previous assumptions upon the mechanism are briefly reviewed. A new model is developed which explains how the coverage of the surface by hydrogen can be maintained in spite of the continuous anodic dissolution.