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Journal Article

The mechanism of the anodic oxidation of silicon in acidic fluoride solutions revisited

MPS-Authors
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Gerischer,  Heinz
Physical Chemistry, Fritz Haber Institute, Max Planck Society;

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Allongue,  Philippe
Physical Chemistry, Fritz Haber Institute, Max Planck Society;

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Costa Kieling,  Virginia
Physical Chemistry, Fritz Haber Institute, Max Planck Society;

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Citation

Gerischer, H., Allongue, P., & Costa Kieling, V. (1993). The mechanism of the anodic oxidation of silicon in acidic fluoride solutions revisited. Berichte der Bunsen-Gesellschaft für Physikalische Chemie, 97(6), 753-756. doi:10.1002/bbpc.19930970602.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0011-2152-5
Abstract
The present experience of the electrochemical dissolution of silicon and previous assumptions upon the mechanism are briefly reviewed. A new model is developed which explains how the coverage of the surface by hydrogen can be maintained in spite of the continuous anodic dissolution.