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Journal Article

The role of oxygen in the photooxidation of organic molecules on semiconductor particles


Gerischer,  Heinz
Physical Chemistry, Fritz Haber Institute, Max Planck Society;

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Gerischer, H., & Heller, A. (1991). The role of oxygen in the photooxidation of organic molecules on semiconductor particles. Journal of Physical Chemistry, 95(13), 5261-5267. doi:10.1021/j100166a063.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0011-225C-9
The kinetics of O2 reduction accompanying oxidation of organic compounds on photocatalytic semiconductor particles is analyzed. The rate-controlling processes are defined and the electron reactivities are derived for two cases: A, electrons moving freely in the semiconductor particle and reacting with O2 anywhere on its surface and B, electrons trapped at or near the surface of the semiconductor particle and transferred from the traps only to nearby O2 molecules. Of these, case B appears realistic. Taking the properties of TiO2 particles as an example, it is shown that a sufficiently fast O2 reduction rate, of essence for attaining a high quantum efficiency in the photoassisted oxidation of organics, is achieved only when catalytic sites are incorporated in the TiO2 surface.