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Journal Article

In Situ Characterization of Alloy Catalysts for Low-Temperature Graphene Growth

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Schlögl,  Robert
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

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Citation

Weatherup, R. S., Bayer, B. C., Blume, R., Ducati, C., Baehtz, C., Schlögl, R., et al. (2011). In Situ Characterization of Alloy Catalysts for Low-Temperature Graphene Growth. Nano Letters, 11(10), 4154-4160. doi:10.1021/nl202036y.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0011-543F-F
Abstract
Low-temperature (450 °C), scalable chemical vapor deposition of predominantly monolayer (74%) graphene films with an average D/G peak ratio of 0.24 and domain sizes in excess of 220 μm2 is demonstrated via the design of alloy catalysts. The admixture of Au to polycrystalline Ni allows a controlled decrease in graphene nucleation density, highlighting the role of step edges. In situ, time-, and depth-resolved X-ray photoelectron spectroscopy and X-ray diffraction reveal the role of subsurface C species and allow a coherent model for graphene formation to be devised.