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Conference Paper

Development of a metrology to characterize EUV optics at 13.5nm

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Vongehr,  Monika
High Energy Astrophysics, MPI for Extraterrestrial Physics, Max Planck Society;

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Predehl,  Peter
High Energy Astrophysics, MPI for Extraterrestrial Physics, Max Planck Society;

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Hasinger,  Günther
High Energy Astrophysics, MPI for Extraterrestrial Physics, Max Planck Society;

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Vongehr, M., Predehl, P., & Hasinger, G. (2006). Development of a metrology to characterize EUV optics at 13.5nm. In J. T. Sheridan, & F. Wyrowski (Eds.), Photon Management II (pp. 618709-1-618709-9). Bellingham, Wash., USA: The International Society for Optical Engineering.


Cite as: https://hdl.handle.net/11858/00-001M-0000-0011-D2E1-9
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