Quantitative characterization of dislocation structure coupled with electromigration in a passivated Al(0.5wt% Cu) interconnect::MPG.PuRe

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Quantitative characterization of dislocation structure coupled with electromigration in a passivated Al(0.5wt% Cu) interconnect

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Name of Tag Jg 2002 - 2005 2012-12-05 13:57