Ion beam analysis of porous thin films

Mayer, M.; von Toussaint, U.; Dewalque, J.; Dubreuil, O.; Henrist, C.; Cloots, R.; Mathis, F.

アイテム詳細

登録内容を編集ファイル形式で保存

一時保存へ追加

タグ情報を表示リリース履歴を表示詳細要約

公開

ポスター

Ion beam analysis of porous thin films

MPS-Authors

/persons/resource/persons109910

Mayer, M.
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons110652

von Toussaint, U.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;

External Resource

There are no locators available

Fulltext (restricted access)

There are currently no full texts shared for your IP range.

フルテキスト (公開)

公開されているフルテキストはありません

付随資料 (公開)

There is no public supplementary material available

引用

Mayer, M., von Toussaint, U., Dewalque, J., Dubreuil, O., Henrist, C., Cloots, R., & Mathis, F. (2011). Ion beam analysis of porous thin films. Poster presented at 20th International Conference on Ion Beam Analysis (IBA 2011), Itapema, SC.

引用: https://hdl.handle.net/21.11116/0000-0000-5B2E-8

要旨

要旨はありません