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Journal Article

Visible-light silicon nitride waveguide devices and implantable neurophotonic probes on thinned 200 mm silicon wafers

MPS-Authors
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Sacher,  Wesley D.
Nanophotonics, Integration, and Neural Technology, Max Planck Institute of Microstructure Physics, Max Planck Society;

Mak,  Jason C. C.
Max Planck Institute of Microstructure Physics, Max Planck Society;

/persons/resource/persons257612

Poon,  Joyce K. S.
Nanophotonics, Integration, and Neural Technology, Max Planck Institute of Microstructure Physics, Max Planck Society;

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Citation

Sacher, W. D., Luo, X., Yang, Y., Chen, F.-D., Lordello, T., Mak, J. C. C., et al. (2019). Visible-light silicon nitride waveguide devices and implantable neurophotonic probes on thinned 200 mm silicon wafers. Optics Express, 27(26), 37400-37418. doi:10.1364/OE.27.037400.


Cite as: https://hdl.handle.net/21.11116/0000-0008-2277-C
Abstract
We present passive, visible light silicon nitride waveguides fabricated on ≈100 μm thick 200 mm silicon wafers using deep ultraviolet lithography. The best-case propagation losses of single-mode waveguides were ≤ 2.8 dB/cm and ≤ 1.9 dB/cm over continuous wavelength ranges of 466-550 nm and 552-648 nm, respectively. In-plane waveguide crossings and multimode interference power splitters are also demonstrated. Using this platform, we realize a proof-of-concept implantable neurophotonic probe for optogenetic stimulation of rodent brains. The probe has grating coupler emitters defined on a 4 mm long, 92 μm thick shank and operates over a wide wavelength range of 430-645 nm covering the excitation spectra of multiple opsins and fluorophores used for brain stimulation and imaging.