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Structural determination for H2O adsorption on Si(001)2 × 1 using scanned-energy mode photoelectron diffraction

MPS-Authors
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Giebel,  T.
Fritz Haber Institute, Max Planck Society;

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Lindsay,  Robert
Fritz Haber Institute, Max Planck Society;

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Fritzsche,  V.
Fritz Haber Institute, Max Planck Society;

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Bradshaw,  Alexander M.
Fritz Haber Institute, Max Planck Society;

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Citation

Franco, N., Chrost, J., Avilaa, J., Asensioa, M., Müller, C., Dudzik, E., et al. (1998). Structural determination for H2O adsorption on Si(001)2 × 1 using scanned-energy mode photoelectron diffraction. Applied Surface Science, 123-124, 219-222. doi:10.1016/S0169-4332(97)00506-0.


Cite as: https://hdl.handle.net/21.11116/0000-0008-B48B-0
Abstract
Using scanned-energy-mode photoelectron diffraction we have determined the local adsorption geometry of the OH fragments adsorbed on Si(100)(2 × 1) surface. On this substrate water is known to adsorb dissociatively even at low temperature (90 K), which gives rise to a surface layer comprising coadsorbed OH and H species. The OH fragments are found to be adsorbed in off-atop sites at a dimerised surface Si atom with Osingle bondSi bond-lengths of 1.7 ± 0.1Å and bond-angles relative to the surface normal of 22 ± 5°.