date: 2024-05-03T06:31:33Z pdf:PDFVersion: 1.7 pdf:docinfo:title: The fate of graphene on copper: Intercalation / de-intercalation processes and the role of silicon xmp:CreatorTool: Elsevier access_permission:can_print_degraded: true subject: Carbon, 226 (2024) 119172. doi:10.1016/j.carbon.2024.119172 language: en dc:format: application/pdf; version=1.7 pdf:docinfo:custom:robots: noindex pdf:docinfo:creator_tool: Elsevier access_permission:fill_in_form: true pdf:docinfo:custom:CreationDate--Text: 3rd May 2024 pdf:encrypted: false dc:title: The fate of graphene on copper: Intercalation / de-intercalation processes and the role of silicon modified: 2024-05-03T06:31:33Z cp:subject: Carbon, 226 (2024) 119172. doi:10.1016/j.carbon.2024.119172 pdf:docinfo:custom:CrossMarkDomains[1]: elsevier.com robots: noindex pdf:docinfo:subject: Carbon, 226 (2024) 119172. doi:10.1016/j.carbon.2024.119172 pdf:docinfo:creator: Tim Kratky meta:author: Paul Leidinger meta:creation-date: 2024-05-03T05:49:12Z created: 2024-05-03T05:49:12Z access_permission:extract_for_accessibility: true Creation-Date: 2024-05-03T05:49:12Z pdf:docinfo:custom:CrossMarkDomains[2]: sciencedirect.com ElsevierWebPDFSpecifications: 7.0 pdf:docinfo:custom:doi: 10.1016/j.carbon.2024.119172 Author: Paul Leidinger producer: Acrobat Distiller 8.1.0 (Windows) pdf:docinfo:producer: Acrobat Distiller 8.1.0 (Windows) CreationDate--Text: 3rd May 2024 doi: 10.1016/j.carbon.2024.119172 pdf:unmappedUnicodeCharsPerPage: 0 dc:description: Carbon, 226 (2024) 119172. doi:10.1016/j.carbon.2024.119172 Keywords: Chemical vapor deposition,Low-energy electron microscopy,X-ray photoemission electron microscopy,Graphene on copper,Si segregation,Intercalation/de-intercalation access_permission:modify_annotations: true dc:creator: Paul Leidinger description: Carbon, 226 (2024) 119172. doi:10.1016/j.carbon.2024.119172 dcterms:created: 2024-05-03T05:49:12Z Last-Modified: 2024-05-03T06:31:33Z dcterms:modified: 2024-05-03T06:31:33Z title: The fate of graphene on copper: Intercalation / de-intercalation processes and the role of silicon xmpMM:DocumentID: uuid:1b499bed-4ce8-4c0c-b682-0d58baae1cbe Last-Save-Date: 2024-05-03T06:31:33Z CrossMarkDomains[1]: elsevier.com pdf:docinfo:keywords: Chemical vapor deposition,Low-energy electron microscopy,X-ray photoemission electron microscopy,Graphene on copper,Si segregation,Intercalation/de-intercalation pdf:docinfo:modified: 2024-05-03T06:31:33Z meta:save-date: 2024-05-03T06:31:33Z Content-Type: application/pdf X-Parsed-By: org.apache.tika.parser.DefaultParser creator: Paul Leidinger dc:language: en dc:subject: Chemical vapor deposition,Low-energy electron microscopy,X-ray photoemission electron microscopy,Graphene on copper,Si segregation,Intercalation/de-intercalation pdf:docinfo:custom:ElsevierWebPDFSpecifications: 7.0 access_permission:assemble_document: true xmpTPg:NPages: 13 pdf:charsPerPage: 4785 access_permission:extract_content: true access_permission:can_print: true CrossMarkDomains[2]: sciencedirect.com meta:keyword: Chemical vapor deposition,Low-energy electron microscopy,X-ray photoemission electron microscopy,Graphene on copper,Si segregation,Intercalation/de-intercalation access_permission:can_modify: true pdf:docinfo:created: 2024-05-03T05:49:12Z