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  Synchrotron radiation and low-energy electron-diffraction studies of ultrathin C60 films deposited on Cu(100), Cu(111) and Cu(110)

Rowe, J. E., Rudolf, P., Tjeng, L. H., Malic, R. A., Meigs, G., Chen, C. T., et al. (1992). Synchrotron radiation and low-energy electron-diffraction studies of ultrathin C60 films deposited on Cu(100), Cu(111) and Cu(110). International Journal of Modern Physics B [Condensed Matter Physics; Statistical Physics; Applied Physics], 6(23-24), 3909-3913. doi:10.1142/S0217979292001997.

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 Creators:
Rowe, J. E.1, Author
Rudolf, P.1, Author
Tjeng, L. H.2, Author           
Malic, R. A.1, Author
Meigs, G.1, Author
Chen, C. T.1, Author
Chen, J.1, Author
Plummer, E. W.1, Author
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1external, ou_persistent22              
2External Organizations, ou_persistent22              

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 Abstract: High resolution K-edge photoemission and X-ray absorption spectroscopies have been used to study the chemical properties of the interface formed with C60 and Cu. We find that for very thin (0.24 - 1 monolayers) C60 films, deposited in ultrahigh vacuum, the Cu substrate plays a role similar to that of K in K3C60 films. Thus Cu donates charge to partially fill the pi* LUMO band, and the C (1s) core level shifts due to charge transfer. For monolayer coverage the C (1s) core-level line shape is broad. Low energy electron diffraction studies of C60 on Cu(100), Cu(111) and Cu(110) show that well ordered overlayers of thickness > 2 monolayers can be formed on all three Cu surfaces, but single-domain epitaxy is achieved only on Cu(111). The substrate temperature during C60 deposition is critical for the ordering of the film.

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 Dates: 1992-12-01
 Publication Status: Issued
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 Rev. Type: -
 Identifiers: ISI: A1992KN27400036
DOI: 10.1142/S0217979292001997
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Title: International Journal of Modern Physics B [Condensed Matter Physics; Statistical Physics; Applied Physics]
  Other : Int. Journ. Mod. Phys. B
Source Genre: Journal
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Publ. Info: Singapore : World Scientific
Pages: - Volume / Issue: 6 (23-24) Sequence Number: - Start / End Page: 3909 - 3913 Identifier: ISSN: 0217-9792
CoNE: https://pure.mpg.de/cone/journals/resource/954925493938_1