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  Near-Field Lithography by Two-Photon-Induced Photocleavage of Organic Monolayers

Alvarez, M., Best, A., Unger, A., Alonso, J. M., del Campo, A., Schmelzeisen, M., et al. (2010). Near-Field Lithography by Two-Photon-Induced Photocleavage of Organic Monolayers. Advanced Functional Materials, 20(24), 4265-4272.

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 Creators:
Alvarez, M.1, Author           
Best, A.1, Author           
Unger, A.1, Author           
Alonso, J. M., Author
del Campo, Aranzazu1, Author           
Schmelzeisen, M.1, Author           
Koynov, Kaloian1, Author           
Kreiter, Max1, Author           
Affiliations:
1MPI for Polymer Research, Max Planck Society, ou_1309545              

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Language(s): eng - English
 Dates: 2010
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 528706
Other: P-10-343
 Degree: -

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Title: Advanced Functional Materials
  Alternative Title : Adv. Funct. Mater.
Source Genre: Journal
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Publ. Info: -
Pages: - Volume / Issue: 20 (24) Sequence Number: - Start / End Page: 4265 - 4272 Identifier: -