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  The effect of deposition parameters and substrate surface condition on texture, morphology and stress in magnetron-sputter-deposited Cu thin films

Okolo, B., Lamparter, P., Welzel, U., Wagner, T., & Mittemeijer, E. (2005). The effect of deposition parameters and substrate surface condition on texture, morphology and stress in magnetron-sputter-deposited Cu thin films. Thin Solid Films, 474, 50-63.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-27E6-7 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-27E7-5
Genre: Journal Article

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 Creators:
Okolo, B.1, Author           
Lamparter, P.1, Author           
Welzel, U.1, Author           
Wagner, T.2, Author           
Mittemeijer, E.J.1, 3, Author           
Affiliations:
1Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497644              
2Central Scientific Facility Thin Film Laboratory, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497640              
3Universität Stuttgart, Institut für Materialwissenschaft, ou_persistent22              

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Free keywords: MPI für Metallforschung; Abt. Mittemeijer; Abt. Arzt; ZWE Dünnschichtlabor;
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Language(s): eng - English
 Dates: 2005
 Publication Status: Issued
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 Rev. Type: Peer
 Identifiers: eDoc: 240117
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Title: Thin Solid Films
Source Genre: Journal
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Pages: - Volume / Issue: 474 Sequence Number: - Start / End Page: 50 - 63 Identifier: -