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  Near-field lithography by two-photon-induced photocleavage of organic monolayers

Álvarez, M., Best, A., Unger, A., Alonso, J. M., del Campo, A., Schmelzeisen, M., et al. (2010). Near-field lithography by two-photon-induced photocleavage of organic monolayers. Advanced Funktional Functions, 20(24), 4265-4272. doi:10.1002/adfm.201000939.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-0010-4F50-C Version Permalink: http://hdl.handle.net/11858/00-001M-0000-0010-4F51-A
Genre: Journal Article

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 Creators:
Álvarez, M.1, Author
Best, A.1, Author
Unger, A.1, Author
Alonso, J. M.2, Author              
del Campo, A.2, Author              
Schmelzeisen, M.1, Author
Koynov, K.1, Author
Kreiter, M.1, Author
Affiliations:
1CIC nanoGUNE Consolider, San Sebastián, Spain, ou_persistent22              
2Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497655              

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Free keywords: MPI für Metallforschung; MPI für Polymerforschung; Abt. Arzt; AK Spiess;
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Language(s): eng - English
 Dates: 2010-10-15
 Publication Status: Published in print
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Method: Peer
 Identifiers: eDoc: 532539
DOI: 10.1002/adfm.201000939
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Title: Advanced Funktional Functions
Source Genre: Journal
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Publ. Info: -
Pages: - Volume / Issue: 20 (24) Sequence Number: - Start / End Page: 4265 - 4272 Identifier: -