Near-field lithography by two-photon-induced photocleavage of organic monolayers

Álvarez, M.; Best, A.; Unger, A.; Alonso, J. M.; del Campo, A.; Schmelzeisen, M.; Koynov, K.; Kreiter, M.

doi:10.1002/adfm.201000939

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Near-field lithography by two-photon-induced photocleavage of organic monolayers

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Alonso, J. M.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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del Campo, A.
Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Álvarez, M., Best, A., Unger, A., Alonso, J. M., del Campo, A., Schmelzeisen, M., Koynov, K., & Kreiter, M. (2010). Near-field lithography by two-photon-induced photocleavage of organic monolayers. Advanced Funktional Functions, 20(24), 4265-4272. doi:10.1002/adfm.201000939.

引用: https://hdl.handle.net/11858/00-001M-0000-0010-4F50-C

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