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  Lithography-free approaches to patterned multilayers based on wrinkling

Fery, A., Böker, A., Hanske, C., Horn, A., Lu, C. H., Pretzl, M., et al. (2008). Lithography-free approaches to patterned multilayers based on wrinkling. Abstracts of Papers of the American Chemical Society, 236: 86-PMSE.

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Item Permalink: http://hdl.handle.net/11858/00-001M-0000-0015-52E2-7 Version Permalink: http://hdl.handle.net/21.11116/0000-0007-540E-C
Genre: Meeting Abstract

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Abstract.pdf (Any fulltext), 665KB
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 Creators:
Fery, A., Author
Böker, A., Author
Hanske, C., Author
Horn, A., Author
Lu, C. H.1, Author              
Pretzl, M., Author
Schweikart, A., Author
Affiliations:
1Grenzflächen, Max Planck Institute of Colloids and Interfaces, Max Planck Society, ou_1863287              

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Language(s): eng - English
 Dates: 2008
 Publication Status: Published in print
 Pages: -
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 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 456362
ISI: 000270280001144
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Title: Abstracts of Papers of the American Chemical Society
  Alternative Title : Abstr. Pap. Am. Chem. Soc.
Source Genre: Journal
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Pages: - Volume / Issue: 236 Sequence Number: 86-PMSE Start / End Page: - Identifier: ISSN: 0065-7727