Lithography-free approaches to patterned multilayers based on wrinkling

Fery, A.; Böker, A.; Hanske, C.; Horn, A.; Lu, C. H.; Pretzl, M.; Schweikart, A.

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Lithography-free approaches to patterned multilayers based on wrinkling

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Lu, C. H.
Grenzflächen, Max Planck Institute of Colloids and Interfaces, Max Planck Society;

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Fery, A., Böker, A., Hanske, C., Horn, A., Lu, C. H., Pretzl, M., et al. (2008). Lithography-free approaches to patterned multilayers based on wrinkling. Abstracts of Papers of the American Chemical Society, 236: 86-PMSE.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0015-52E2-7

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