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  Hard x-ray photoemission spectroscopy of Bi2S3 thin films

ten Haaf, S., Balke, B., Felser, C., & Jakob, G. (2012). Hard x-ray photoemission spectroscopy of Bi2S3 thin films. Journal of Applied Physics, 112(5): 053705, pp. 1-4. doi:10.1063/1.4748299.

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ten Haaf, Sebastian1, Autor
Balke, Benjamin1, Autor
Felser, Claudia2, Autor           
Jakob, Gerhard1, Autor
Affiliations:
1external, ou_persistent22              
2External Organizations, ou_persistent22              

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 Zusammenfassung: The electronic structure of polycrystalline Bi2S3 thin films deposited by thermal evaporation under high vacuum conditions was investigated with respect to their potential use as absorber materials in p-i-n solar cells by means of hard x-ray photoemission spectroscopy at the PETRA III synchrotron. A clear influence of the post-deposition treatment on the electronic structure could be observed, resulting in a lowering of the Fermi level as well as in a change of the electronic states in the valence band. Furthermore, chemical shifts of Bi2S3 were determined in the bulk-sensitive hard x-ray regime as Delta E-B,E-Bi = 1:35 eV and Delta E-B,E-S = -2:80 eV. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4748299]

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 Datum: 2012-09-01
 Publikationsstatus: Erschienen
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 Identifikatoren: ISI: 000309072200064
DOI: 10.1063/1.4748299
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Titel: Journal of Applied Physics
Genre der Quelle: Zeitschrift
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Ort, Verlag, Ausgabe: New York, NY : American Institute of Physics
Seiten: - Band / Heft: 112 (5) Artikelnummer: 053705 Start- / Endseite: 1 - 4 Identifikator: ISSN: 0021-8979
CoNE: https://pure.mpg.de/cone/journals/resource/991042723401880